Ultrathin Ni-Mo-P diffusion barriers deposited using nonisothermal deposition method in acid bath

Yu Hsien Chou, Yuh Sung, Keng Liang Ou, Yih Ming Liu, Ming Der Ger

研究成果: 雜誌貢獻文章同行評審

8 引文 斯高帕斯(Scopus)

摘要

The performance and thermal stability of the ultrathin nickel-molybdenum- phosphorus (Ni-Mo-P) barrier layer deposited by the nonisothermal deposition method in acid electroless bath have been clearly investigated. The as-deposited Ni-Mo-P film (15 nm) has a low resistivity, contains high amounts of Mo (6.7 atom %) and P (25 atom %), and has an amorphous structure. The barrier capability of this Ni-Mo-P film remains stable up to 650°C for 1 h annealing. This reveals that the resistance of Ni-Mo-P barrier film against Cu diffusion is very prominent, and this method for depositing Ni-Mo-P films is extremely promising for ultralarge-scale integration application.

原文英語
頁(從 - 到)D30-D33
期刊Electrochemical and Solid-State Letters
11
發行號2
DOIs
出版狀態已發佈 - 2008

ASJC Scopus subject areas

  • 一般化學工程
  • 電氣與電子工程
  • 一般材料科學
  • 電化學
  • 物理與理論化學

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