摘要
In this study, we deposited low-resistivity molybdenum (Mo) thin films on soda-lime glass substrates with good adhesion. We adjusted various deposition parameters such as the sputtering power (52-102 W), working distance (5.5-9 cm) and annealing temperature (26-400 °C) to investigate their impact on the sheet resistance. By using a DC magnetron sputtering system, we obtained Mo thin films having the lowest sheet resistance of 0.190 Ω/□ with a sputtering power of 82 W, working distance of 6.5 cm, and annealing temperature of 400 °C; in addition, these films had good adhesivity. These Mo thin films were suitable for use as the Mo back contact in Cu(In,Ga)Se 2-based solar cells.
原文 | 英語 |
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頁(從 - 到) | 5936-5939 |
頁數 | 4 |
期刊 | Thin Solid Films |
卷 | 520 |
發行號 | 18 |
DOIs | |
出版狀態 | 已發佈 - 7月 1 2012 |
ASJC Scopus subject areas
- 電子、光磁材料
- 金屬和合金
- 材料化學
- 表面、塗料和薄膜
- 表面和介面