摘要
A nanocrystal (NC) memory by sol-gel spin-coating method was demonstrated. The high-density and isolated NC was formed by depositing a mixed solution of nickel tetrachloride, zirconium tetrachloride, silicon tetrachloride, and germanium tetrachloride with a post-rapid thermal annealing process. The electrical properties in terms of memory window, charge retention, program/erase speed, and endurance were demonstrated. The memory window of the NC memory can be up to 2.8 V; the retention times were extrapolated up to 106 sec for about 5% and 10% charge loss at 25 and 85 °C measurement, respectively. The voltage shift after 104 program/erase cycles is less than 1V. The good electrical performance was attributed to the effects of the high-density isolated NCs.
原文 | 英語 |
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主出版物標題 | INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings |
頁面 | 1228-1229 |
頁數 | 2 |
DOIs | |
出版狀態 | 已發佈 - 2010 |
對外發佈 | 是 |
事件 | 2010 3rd International Nanoelectronics Conference, INEC 2010 - Hongkong, 中国 持續時間: 1月 3 2010 → 1月 8 2010 |
其他
其他 | 2010 3rd International Nanoelectronics Conference, INEC 2010 |
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國家/地區 | 中国 |
城市 | Hongkong |
期間 | 1/3/10 → 1/8/10 |
ASJC Scopus subject areas
- 電氣與電子工程