摘要
Thermal ALD (T-ALD) and plasma-enhanced ALD (PE-ALD) processes were employed to prepare the Al2O3 thin films on plasticized polyvinyl chloride (PVC) surfaces at a low deposition temperature of 80 °C. The water contact angle test shows that the T-ALD Al2O3 films exhibited a hydrophobic surface, while the PE-ALD Al2O3 films were hydrophilic. The difference in the surface hydrophobicity is attributed to the carbon residue in Al2O3 films, as revealed by the X-ray photoelectron and Fourier transform infrared spectroscopies. The trend of hydrophobicity follows with the evolution of surface roughness of the T-Al2O3 films, indicating that the surface roughness contributed to the hydrophobicity as predicted by the Wenzel's mode. The result indicates that the surface hydrophilicity/hydrophobicity of the Al2O3 thin films can be modified and controlled by the deposition conditions of the ALD process.
原文 | 英語 |
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頁(從 - 到) | 158-164 |
頁數 | 7 |
期刊 | Surface and Coatings Technology |
卷 | 305 |
DOIs | |
出版狀態 | 已發佈 - 11月 15 2016 |
ASJC Scopus subject areas
- 一般化學
- 凝聚態物理學
- 表面和介面
- 表面、塗料和薄膜
- 材料化學