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Pulsed laser deposition of (MoO3)1 - X(V 2O5)x thin films: Preparation, characterization and gasochromic studies

  • Chung Chieh Chang
  • , Jiu Yong Luo
  • , Ta Kun Chen
  • , Kuo Wei Yeh
  • , Tzu Wen Huang
  • , Chia Hao Hsu
  • , Wei Hsiang Chao
  • , Chung Ting Ke
  • , Po Chun Hsu
  • , Ming Jye Wang
  • , Mau Kuen Wu

Research output: Contribution to journalArticlepeer-review

Abstract

In this study we demonstrate a new composite oxide thin films of (MoO 3)1 - x(V2O5)x, x = 0, 0.01, 0.03, and 0.05, fabricated by pulsed laser deposition (PLD). The performance of platinum (Pt) catalyst activated hydrogen gas sensor with modified (MoO3)1 - x(V2O5) x thin films were investigated. The thickness of the (MoO 3)1 - x(V2O5)x thin film is about 600-650 nm and its surface has a uniform morphology. Our results show that the gasochromic sensors prepared by (MoO3)0.99(V 2O5)0.01 thin film exhibited excellent hydrogen sensibility. The response and recovery time are in the range of 9-15 min for coloration and bleaching at room temperature under H2 atmosphere. The results also show that (MoO3)1 - x(V2O 5)x/Pt (x = 0.01, 0.03, 0.05) thin films perform better gasochromic capability than the pristine MoO3/Pt sample.

Original languageEnglish
Pages (from-to)1552-1557
Number of pages6
JournalThin Solid Films
Volume519
Issue number5
DOIs
Publication statusPublished - Dec 30 2010
Externally publishedYes

Keywords

  • Hydrogen sensor
  • Molybdenum oxide
  • PLD
  • Vanadium oxide gasochromic

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

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