Morphological control of platinum nanostructures for highly efficient dye-sensitized solar cells

Lu Lin Li, Chia Wei Chang, Hsin Hui Wu, Jia Wei Shiu, Po Ting Wu, Eric Wei-Guang Diau

Research output: Contribution to journalArticlepeer-review

58 Citations (Scopus)

Abstract

Cyclic electro-deposition (CED) is a cost-effective tool to synthesize nanostructures with a solution process, controllable morphology and high purity. Here we report novel platinum nanostructures fabricated according to CED at room temperature in solution containing H2PtCl6 precursor and NaNO3. Remarkable Pt nanostructures - from nanoclusters, nanosheets, nanograsses to nanoflowers - were produced through morphological control via variation of either period of CED scans or concentration of the precursor. Pt films with uniform nanograss structures have great electro-catalytic performance (electron-transfer resistance = 0.3 Ω) and intrinsic light-scattering (reflectivity ∼50%), perfectly suitable for use as counter-electrodes for dye-sensitized solar cells (DSSCs). The DSSC device made with the Pt-nanograss counter-electrode and N719 dye attained efficiency η = 9.61% of power conversion, which is 12% enhanced from that fabricated according to a conventional thermal decomposition method (η = 8.55%) under similar experimental conditions. When the devices were further optimized with a thick TiO2 film (17 + 5 μm) sensitized by Z907 dye using the CED-Pt counter-electrode, we obtained JSC (mA cm-2) = 19.44, VOC (V) = 0.742, and FF = 0.736, giving an exceptional power conversion efficiency of 10.62%.

Original languageEnglish
Pages (from-to)6267-6273
Number of pages7
JournalJournal of Materials Chemistry
Volume22
Issue number13
DOIs
Publication statusPublished - Apr 7 2012
Externally publishedYes

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Chemistry

Fingerprint

Dive into the research topics of 'Morphological control of platinum nanostructures for highly efficient dye-sensitized solar cells'. Together they form a unique fingerprint.

Cite this