Method for localizing implanted intracranial electrode

Syu-Jyun Peng (Inventor), Cheng-Chia Lee (Inventor), Chien Chen Chou (Inventor), Hsiang Yu Yu (Inventor)

Research output: Patent


A method for localizing an intracranial electrode in a subject's brain is provided. The intracranial electrode has at least one electrode contact. The method includes: acquiring a first brain image reconstructed from first image data acquired after electrode-implantation; acquiring a second brain image reconstructed from second image data acquired before the electrode-implantation; co-registering the first brain image and the second brain image to acquire spatial transformation parameters; extracting a first coordinate of the electrode contact from the first brain image; converting the first coordinate into a second coordinate in the second brain image by using the spatial transformation parameters; co-registering the second brain image and a universal brain atlas to define functional zones in the second brain image; and defining a corresponding functional zone where the second coordinate is located. Another alternative method and a system for localizing an intracranial electrode are also provided herein.
Original languageEnglish
Patent number11205267
Publication statusPublished - Dec 21 2021


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