Lichen Planus Pigmentosus Inversus Caused by Occupational Systemic Sensitization to Metals in a Semiconductor Factory Worker

Che Yuan Hsu; Donald Liu; Woan Ruoh Lee; Yi Hsien Shih

doi:10.1097/DER.0000000000000292

Lichen Planus Pigmentosus Inversus Caused by Occupational Systemic Sensitization to Metals in a Semiconductor Factory Worker

Research output: Contribution to journal › Comment/debate › peer-review

Original language	English
Pages (from-to)	324-326
Number of pages	3
Journal	Dermatitis
Volume	28
Issue number	5
DOIs	https://doi.org/10.1097/DER.0000000000000292
Publication status	Published - Sept 1 2017

ASJC Scopus subject areas

Immunology and Allergy
Dermatology

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10.1097/DER.0000000000000292

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title = "Lichen Planus Pigmentosus Inversus Caused by Occupational Systemic Sensitization to Metals in a Semiconductor Factory Worker",

author = "Hsu, \{Che Yuan\} and Donald Liu and Lee, \{Woan Ruoh\} and Shih, \{Yi Hsien\}",

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T1 - Lichen Planus Pigmentosus Inversus Caused by Occupational Systemic Sensitization to Metals in a Semiconductor Factory Worker

AU - Hsu, Che Yuan

AU - Liu, Donald

AU - Lee, Woan Ruoh

AU - Shih, Yi Hsien

PY - 2017/9/1

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M3 - Comment/debate

AN - SCOPUS:85032468527

SN - 1710-3568

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EP - 326

JO - Dermatitis

JF - Dermatitis

IS - 5

ER -

Lichen Planus Pigmentosus Inversus Caused by Occupational Systemic Sensitization to Metals in a Semiconductor Factory Worker

ASJC Scopus subject areas

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