Abstract
In this study, transparent thin films of Sn-doped ZnO (ZnO:Sn) were deposited onto alkali-free glass substrates by a sol-gel method; the effect of Sn doping on crystallinity, microstructural and optical properties was investigated. The atomic percentages of dopant in ZnO-based sols were Sn/Zn = 0, 1, 2, 3, and 5 at.%. The as-deposited films were pre-heated at 300 °C for 10 min and then annealed in air at 500 °C for 1 h. The results show that Sn-doped ZnO thin films demonstrate obviously improved surface roughness, enhanced transmittance in the 400-600 nm wavelength range and reduced average crystallite size. Among all of the annealed ZnO-based films in this study, films doped with 2 at.% Sn concentration exhibited the best properties, namely an average transmittance of 90%, an RMS roughness value of 1.92 nm and a resistivity of 9.3 × 102 Ω-cm.
Original language | English |
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Pages (from-to) | 1032-1036 |
Number of pages | 5 |
Journal | Thin Solid Films |
Volume | 517 |
Issue number | 3 |
DOIs | |
Publication status | Published - Dec 1 2008 |
Externally published | Yes |
Keywords
- Sn doping
- Sol-gel method
- Transparent oxide semiconductors
- ZnO thin films
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry