DNA mismatch detection by metal ion enhanced impedance analysis

Peng Chung Jangjian; Tzeng Feng Liu; Chuan Mei Tsai; Mei Yi Li; Ming Shih Tsai; Shin Hua Tseng; Tsai Mu Cheng; Chia Ching Chang

DNA mismatch detection by metal ion enhanced impedance analysis

Peng Chung Jangjian
, Tzeng Feng Liu
, Chuan Mei Tsai
, Mei Yi Li
, Ming Shih Tsai
, Shin Hua Tseng
, Tsai Mu Cheng
, Chia Ching Chang

Research output: Contribution to journal › Article › peer-review

Abstract

Conventional diagnoses of genetic mutation and disease depend on the analysis of DNA sequences. However, mismatches in the DNA sequences are difficult to detect using tradi- tional sequencing. Doping metal ions, such as nickel, into the short DNA (28 mer ~ 30 mer), markedly reduces its electrical resistance, which is measured by electrical impedance analysis. The change in resistance that is caused by a mismatched base-pair in short DNA can also be monitored by this approach. In this study, the resistance increased exponentially with the number of mismatched base-pairs. Accordingly, an intuitive and direct method for evaluating the number of DNA mismatches can possibly be developed.

Original language	English
Pages (from-to)	740-747
Number of pages	8
Journal	Chinese Journal of Physics
Volume	47
Issue number	5
Publication status	Published - Oct 2009
Externally published	Yes

ASJC Scopus subject areas

General Physics and Astronomy

Cite this

@article{134c4937e4994d38bf0b55ceca5b354f,

title = "DNA mismatch detection by metal ion enhanced impedance analysis",

abstract = "Conventional diagnoses of genetic mutation and disease depend on the analysis of DNA sequences. However, mismatches in the DNA sequences are difficult to detect using tradi- tional sequencing. Doping metal ions, such as nickel, into the short DNA (28 mer \textasciitilde{} 30 mer), markedly reduces its electrical resistance, which is measured by electrical impedance analysis. The change in resistance that is caused by a mismatched base-pair in short DNA can also be monitored by this approach. In this study, the resistance increased exponentially with the number of mismatched base-pairs. Accordingly, an intuitive and direct method for evaluating the number of DNA mismatches can possibly be developed.",

author = "Jangjian, \{Peng Chung\} and Liu, \{Tzeng Feng\} and Tsai, \{Chuan Mei\} and Li, \{Mei Yi\} and Tsai, \{Ming Shih\} and Tseng, \{Shin Hua\} and Cheng, \{Tsai Mu\} and Chang, \{Chia Ching\}",

year = "2009",

month = oct,

language = "English",

volume = "47",

pages = "740--747",

journal = "Chinese Journal of Physics",

issn = "0577-9073",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - DNA mismatch detection by metal ion enhanced impedance analysis

AU - Jangjian, Peng Chung

AU - Liu, Tzeng Feng

AU - Tsai, Chuan Mei

AU - Li, Mei Yi

AU - Tsai, Ming Shih

AU - Tseng, Shin Hua

AU - Cheng, Tsai Mu

AU - Chang, Chia Ching

PY - 2009/10

Y1 - 2009/10

N2 - Conventional diagnoses of genetic mutation and disease depend on the analysis of DNA sequences. However, mismatches in the DNA sequences are difficult to detect using tradi- tional sequencing. Doping metal ions, such as nickel, into the short DNA (28 mer ~ 30 mer), markedly reduces its electrical resistance, which is measured by electrical impedance analysis. The change in resistance that is caused by a mismatched base-pair in short DNA can also be monitored by this approach. In this study, the resistance increased exponentially with the number of mismatched base-pairs. Accordingly, an intuitive and direct method for evaluating the number of DNA mismatches can possibly be developed.

AB - Conventional diagnoses of genetic mutation and disease depend on the analysis of DNA sequences. However, mismatches in the DNA sequences are difficult to detect using tradi- tional sequencing. Doping metal ions, such as nickel, into the short DNA (28 mer ~ 30 mer), markedly reduces its electrical resistance, which is measured by electrical impedance analysis. The change in resistance that is caused by a mismatched base-pair in short DNA can also be monitored by this approach. In this study, the resistance increased exponentially with the number of mismatched base-pairs. Accordingly, an intuitive and direct method for evaluating the number of DNA mismatches can possibly be developed.

UR - https://www.scopus.com/pages/publications/77349091342

UR - https://www.scopus.com/pages/publications/77349091342#tab=citedBy

M3 - Article

AN - SCOPUS:77349091342

SN - 0577-9073

VL - 47

SP - 740

EP - 747

JO - Chinese Journal of Physics

JF - Chinese Journal of Physics

IS - 5

ER -

DNA mismatch detection by metal ion enhanced impedance analysis

Abstract

ASJC Scopus subject areas

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