Application of ozone related processes to mineralize tetramethyl ammonium hydroxide in aqueous solution

Chyow San Chiou; Kai Jen Chuang; Ya Fen Lin; Hua Wei Chen; Chih Ming Ma

doi:10.1155/2013/191742

Application of ozone related processes to mineralize tetramethyl ammonium hydroxide in aqueous solution

Chyow San Chiou, Kai Jen Chuang, Ya Fen Lin, Hua Wei Chen, Chih Ming Ma

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO ₂/Fe₃O₄) and O₃, denoted as UV/O₃, to TMAH in an aqueous solution. The mineralization efficiency of TMAH under various conditions follows the sequence: UV/O₃ > UV/H₂O₂/O₃ > H₂O ₂/SiO₂/Fe₃O₄/O₃ > H₂O₂/O₃ > SiO₂/Fe ₃O₄/O₃ > O₃ > UV/H ₂O₂. The results suggest that UV/O₃ process provides the best condition for the mineralization of TMAH (40 mg/L), resulting in 87.6% mineralization, at 60 min reaction time. Furthermore, the mineralization efficiency of SiO₂/Fe₃O₄/H ₂O₂/O₃ was significantly higher than that of O₃, H₂O₂/O₃, and UV/H ₂O₂. More than 90% of the magnetic catalyst was recovered and easily redispersed in a solution for reuse.

Original language	English
Article number	191742
Journal	International Journal of Photoenergy
Volume	2013
DOIs	https://doi.org/10.1155/2013/191742
Publication status	Published - 2013

ASJC Scopus subject areas

General Chemistry
Atomic and Molecular Physics, and Optics
General Materials Science
Renewable Energy, Sustainability and the Environment

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10.1155/2013/191742

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@article{02773639533d496e888450c46d3e2233,

title = "Application of ozone related processes to mineralize tetramethyl ammonium hydroxide in aqueous solution",

abstract = "Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO 2/Fe3O4) and O3, denoted as UV/O3, to TMAH in an aqueous solution. The mineralization efficiency of TMAH under various conditions follows the sequence: UV/O3 > UV/H2O2/O3 > H2O 2/SiO2/Fe3O4/O3 > H2O2/O3 > SiO2/Fe 3O4/O3 > O3 > UV/H 2O2. The results suggest that UV/O3 process provides the best condition for the mineralization of TMAH (40 mg/L), resulting in 87.6% mineralization, at 60 min reaction time. Furthermore, the mineralization efficiency of SiO2/Fe3O4/H 2O2/O3 was significantly higher than that of O3, H2O2/O3, and UV/H 2O2. More than 90% of the magnetic catalyst was recovered and easily redispersed in a solution for reuse.",

author = "Chiou, {Chyow San} and Chuang, {Kai Jen} and Lin, {Ya Fen} and Chen, {Hua Wei} and Ma, {Chih Ming}",

year = "2013",

doi = "10.1155/2013/191742",

language = "English",

volume = "2013",

journal = "International Journal of Photoenergy",

issn = "1110-662X",

publisher = "John Wiley and Sons Ltd",

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T1 - Application of ozone related processes to mineralize tetramethyl ammonium hydroxide in aqueous solution

AU - Chiou, Chyow San

AU - Chuang, Kai Jen

AU - Lin, Ya Fen

AU - Chen, Hua Wei

AU - Ma, Chih Ming

PY - 2013

Y1 - 2013

N2 - Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO 2/Fe3O4) and O3, denoted as UV/O3, to TMAH in an aqueous solution. The mineralization efficiency of TMAH under various conditions follows the sequence: UV/O3 > UV/H2O2/O3 > H2O 2/SiO2/Fe3O4/O3 > H2O2/O3 > SiO2/Fe 3O4/O3 > O3 > UV/H 2O2. The results suggest that UV/O3 process provides the best condition for the mineralization of TMAH (40 mg/L), resulting in 87.6% mineralization, at 60 min reaction time. Furthermore, the mineralization efficiency of SiO2/Fe3O4/H 2O2/O3 was significantly higher than that of O3, H2O2/O3, and UV/H 2O2. More than 90% of the magnetic catalyst was recovered and easily redispersed in a solution for reuse.

AB - Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO 2/Fe3O4) and O3, denoted as UV/O3, to TMAH in an aqueous solution. The mineralization efficiency of TMAH under various conditions follows the sequence: UV/O3 > UV/H2O2/O3 > H2O 2/SiO2/Fe3O4/O3 > H2O2/O3 > SiO2/Fe 3O4/O3 > O3 > UV/H 2O2. The results suggest that UV/O3 process provides the best condition for the mineralization of TMAH (40 mg/L), resulting in 87.6% mineralization, at 60 min reaction time. Furthermore, the mineralization efficiency of SiO2/Fe3O4/H 2O2/O3 was significantly higher than that of O3, H2O2/O3, and UV/H 2O2. More than 90% of the magnetic catalyst was recovered and easily redispersed in a solution for reuse.

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Application of ozone related processes to mineralize tetramethyl ammonium hydroxide in aqueous solution

Abstract

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