Anti-adhesive effects of diverse self-assembled monolayers in nanoimprint lithography

Chih Wei Wu; Yung Kang Shen; Sheng Yu Chuang; C. S. Wei

doi:10.1016/j.sna.2006.10.017

Anti-adhesive effects of diverse self-assembled monolayers in nanoimprint lithography

Chih Wei Wu, Yung Kang Shen, Sheng Yu Chuang, C. S. Wei

Research output: Contribution to journal › Article › peer-review

22 Citations (Scopus)

Abstract

Nanoimprint lithography is a highly effective method for manufacturing nanostructures. Although it is an excellent replication technique, the imprinted polymer adheres to the mold into which it is inserted, causing a severe problem. Numerous elementary experiments were performed to evaluate this phenomenon. For example, self-assembled monolayers such as CH₃(CH₂)₁₇SiCl₃ (OTS) and CF₃(CF₂)₇(CH₂)₂SiCl₃ (FDTS) are adopted as an anti-adhesive layer to increase the lifetime of the mold. Processing conditions are presented and the obtained results discussed. Consequently, the height and size of the OTS layer increase with the deposition temperature. After 17 imprint cycles, the amount of polymer residue was least on the mold coated with OTS, immersed in toluene at 25 °C in 20% humidity. The same result was obtained using a mold coated with FDTS. The anti-adhesive efficacy of FDTS is almost constant even as the temperature increased to 300 °C. This anti-adhesive monolayer may be the best choice for high-temperature nanoimprinting.

Original language	English
Pages (from-to)	145-151
Number of pages	7
Journal	Sensors and Actuators, A: Physical
Volume	139
Issue number	1-2 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.sna.2006.10.017
Publication status	Published - Sept 12 2007

Keywords

Anti-adhesive
Nanoimprint
Self-assembled monolayer

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Metals and Alloys
Instrumentation
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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abstract = "Nanoimprint lithography is a highly effective method for manufacturing nanostructures. Although it is an excellent replication technique, the imprinted polymer adheres to the mold into which it is inserted, causing a severe problem. Numerous elementary experiments were performed to evaluate this phenomenon. For example, self-assembled monolayers such as CH3(CH2)17SiCl3 (OTS) and CF3(CF2)7(CH2)2SiCl3 (FDTS) are adopted as an anti-adhesive layer to increase the lifetime of the mold. Processing conditions are presented and the obtained results discussed. Consequently, the height and size of the OTS layer increase with the deposition temperature. After 17 imprint cycles, the amount of polymer residue was least on the mold coated with OTS, immersed in toluene at 25 °C in 20% humidity. The same result was obtained using a mold coated with FDTS. The anti-adhesive efficacy of FDTS is almost constant even as the temperature increased to 300 °C. This anti-adhesive monolayer may be the best choice for high-temperature nanoimprinting.",

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year = "2007",

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AU - Shen, Yung Kang

AU - Chuang, Sheng Yu

AU - Wei, C. S.

PY - 2007/9/12

Y1 - 2007/9/12

N2 - Nanoimprint lithography is a highly effective method for manufacturing nanostructures. Although it is an excellent replication technique, the imprinted polymer adheres to the mold into which it is inserted, causing a severe problem. Numerous elementary experiments were performed to evaluate this phenomenon. For example, self-assembled monolayers such as CH3(CH2)17SiCl3 (OTS) and CF3(CF2)7(CH2)2SiCl3 (FDTS) are adopted as an anti-adhesive layer to increase the lifetime of the mold. Processing conditions are presented and the obtained results discussed. Consequently, the height and size of the OTS layer increase with the deposition temperature. After 17 imprint cycles, the amount of polymer residue was least on the mold coated with OTS, immersed in toluene at 25 °C in 20% humidity. The same result was obtained using a mold coated with FDTS. The anti-adhesive efficacy of FDTS is almost constant even as the temperature increased to 300 °C. This anti-adhesive monolayer may be the best choice for high-temperature nanoimprinting.

AB - Nanoimprint lithography is a highly effective method for manufacturing nanostructures. Although it is an excellent replication technique, the imprinted polymer adheres to the mold into which it is inserted, causing a severe problem. Numerous elementary experiments were performed to evaluate this phenomenon. For example, self-assembled monolayers such as CH3(CH2)17SiCl3 (OTS) and CF3(CF2)7(CH2)2SiCl3 (FDTS) are adopted as an anti-adhesive layer to increase the lifetime of the mold. Processing conditions are presented and the obtained results discussed. Consequently, the height and size of the OTS layer increase with the deposition temperature. After 17 imprint cycles, the amount of polymer residue was least on the mold coated with OTS, immersed in toluene at 25 °C in 20% humidity. The same result was obtained using a mold coated with FDTS. The anti-adhesive efficacy of FDTS is almost constant even as the temperature increased to 300 °C. This anti-adhesive monolayer may be the best choice for high-temperature nanoimprinting.

KW - Anti-adhesive

KW - Nanoimprint

KW - Self-assembled monolayer

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Anti-adhesive effects of diverse self-assembled monolayers in nanoimprint lithography

Abstract

Keywords

ASJC Scopus subject areas

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